Mitsuo Tabata
19Patents
10h-index
27Co-inventors
72Inventor score
Filing activity: Mar 24, 1980 → Jul 28, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4811062A | Method for aligning first and second objects relative to each other and apparatus for practicing this method | Physics | 55 | Expired |
| US4545068A | Image processing system | Physics | 55 | Expired |
| US6084716A | Optical substrate inspection apparatus | Physics | 48 | Expired |
| US5960106A | Sample inspection apparatus and sample inspection method | Physics | 40 | Expired |
| US5744381A | Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof | Electricity | 29 | Expired |
| US5404410A | Method and system for generating a bit pattern | Physics | 22 | Expired |
| US5995219A | Pattern defect inspection apparatus | Physics | 22 | Expired |
| US4326202A | Image memory device | Electricity | 11 | Expired |
| US4698513A | Position detector by vibrating a light beam for averaging the reflected light | Physics | 11 | Expired |
| US4590382A | Method of aligning two members utilizing marks provided thereon | Emerging Cross-Sectional Technologies | 10 | Expired |
| US4572956A | Electron beam pattern transfer system having an autofocusing mechanism | Emerging Cross-Sectional Technologies | 10 | Expired |
| US4642468A | Position detecting method for detecting the relative positions of the first and second members | Electricity | 8 | Expired |
| US5828457A | Sample inspection apparatus and sample inspection method | Physics | 8 | Expired |
| US7068364B2 | Pattern inspection apparatus | Physics | 7 | Expired |
| US5602645A | Pattern evaluation apparatus and a method of pattern evaluation | Physics | 6 | Expired |
| US6909501B2 | Pattern inspection apparatus and pattern inspection method | Physics | 5 | Expired |
| US5812259A | Method and apparatus for inspecting slight defects in a photomask pattern | Physics | 5 | Expired |
| US4808002A | Method and device for aligning first and second objects relative to each other | Physics | 4 | Expired |
| US6100970A | Apparatus for inspecting slight defects on a photomask pattern | Physics | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.