Electrostatic chuck having improved erosion resistance
US5606485A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 1994 |
| Grant date | Feb 25, 1997 |
| Priority date | — |
| Expiry date | Jul 18, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electrostatic chuck having reduced erosion in erosive process environments is described. The electrostatic chuck comprises an insulator with (i) an electrode therein, (ii) a central portion overlying the electrode, and adapted to support a substrate thereon, and (iii) a peripheral portion extending beyond the electrode. In one version of the invention, the central portion of the insulator is raised relative to the lower peripheral portion of the insulator, thereby defining a step having a height H, which is maintained at less than about 10 microns, to reduce erosion of the insulator. In another version of the chuck, the peripheral portion of the insulator extends beyond the electrode and has a width W, which is maintained at at least about 2 mm to reduce erosion of the insulator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.