Process and apparatus for plasma-activated electron beam vaporization

US5614273A · kind A · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Klaus Goedicke · Dresden, DE
• Bert Scheffel · Dresden, DE
• Jonathan Reschke · Dresden, DE
• Siegfried Schiller · Dresden, DE
• Volker Kirchhoff · Dresden, DE
• Torsten Werner · Dresden, DE

Key dates

• Filing date: Apr 29, 1996
• Grant date: Mar 25, 1997
• Expiry date: Apr 29, 2016

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/3053
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process and apparatus for plasma-activated electron beam vaporization is rovided. The vaporizing material from at least two vaporizer crucibles is vaporized with electron beams. An electric voltage is applied to the vaporizer crucibles in such a way that the vapor-emitting areas serve as electrodes of an electric discharge. The vaporizing material acts as a cathode or anode. The process and apparatus are preferably intended for the reactive coating of large surfaces and for the reactive coating of components, tools and strip steel.