Plasma CVD method for producing a diamond coating
US5616373A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1994 |
| Grant date | Apr 1, 1997 |
| Priority date | — |
| Expiry date | Mar 18, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3233
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a method for depositing a diamond coating on a workpiece, for instance a drawing die or a tool punch, whereby a reactive plasma supported coating method is used. According to the invention the generation of the plasma is made by a direct current discharge, whereby additionally a flow of charged particles is fed into the discharge gap; according to the invention the workpiece to be coated is positioned in the discharge gap. Due to the inventive design a relatively long discharge gap can be used, such that also large surface areas can be coated; the coating is made at a location of the highest homogeneity and density of the plasma. By means of the invention a method is provided which can be controlled regarding financial expenses and in a reliable manner and which is suitable for large surface area coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.