Frame-supported pellicle for dustproof protection of photomask
US5616927A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1994 |
| Grant date | Apr 1, 1997 |
| Priority date | — |
| Expiry date | Sep 22, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Proposed is an improved frame-supported pellicle, which is an integral body consisting of a rigid frame, a transparent plastic resin film adhesively bonded to one end surface of the frame in a slack-free fashion and a layer of a pressure-sensitive adhesive on the other end surface of the frame. The improvement consists in the use of a specific pressure-sensitive adhesive capable of being imparted with a greatly decreased bonding strength when it is heated at a temperature higher than a critical temperature or irradiated with UV light in a dose exceeding a critical dose so as to facilitate demounting of the frame-supported pellicle from a photomask on which the pellicle is mounted when it is to be replaced with a new pellicle without leaving any fragments of the adhesive adherent to the photomask surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.