Process and apparatus for the production of a metal oxide layer
US5618575A · kind A · utility
51Cited by
16References
35Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 21, 1995 |
| Grant date | Apr 8, 1997 |
| Priority date | — |
| Expiry date | Apr 21, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3132
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process and apparatus for producing a metal oxide layer which is selectively permeable to ions of a given class, comprises evacuating a vacuum chamber, evaporating metal particles in the chamber and imparting to the particles kinetic energy which is at 10 eV maximum, introducing oxygen into the chamber with a quantity of oxygen being controlled to deposit a metal oxide on a substrate in the chamber, while the substrate is maintained below 900.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.