Inductively coupled plasma generating devices
US5619103A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 1995 |
| Grant date | Apr 8, 1997 |
| Priority date | — |
| Expiry date | Jun 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/048
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A broad area plasma lighting device in which a sealed gas envelope placed adjacent to a planar inductive coupling structure generates visible light. Representative planar inductive coupling structures include a planar spiral coil and a parallel conductor coupling structure. According to the invention, a parallel conductor coupling structure has two basic forms: separate parallel conductors each driven by its own generator/tuning circuit, or single conductor such as a flattened helix or series of square coils driven by one generator/tuning circuit. In addition, a plasma generating device having one or more parallel conductor inductive coupling structures is described. The resulting plasma generator can be used in such applications as plasma processing and inductive plasma lighting.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.