Hardware/software implementation for multipass E-beam mask writing
US5621216A · kind A · utility
24Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 26, 1996 |
| Grant date | Apr 15, 1997 |
| Priority date | — |
| Expiry date | Apr 26, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process smooths the edges of rectangles written by an E-beam lithography system to improve critical dimension (CD) control in these shapes in the preparation of X-ray masks. The CD tolerances of X-ray masks are improved without the usual postprocessing costs normally associated with multipass solutions, thereby saving time and money when multipass writing is used in X-ray lithography. Two enhancements are provided to an X-ray mask maker that allow use of the same E-beam drive code for each exposure of a multipass write operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.