Pattern forming method and projection exposure tool therefor
US5621497A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1995 |
| Grant date | Apr 15, 1997 |
| Priority date | — |
| Expiry date | Apr 3, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70458
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a pattern forming method including the steps of preparing second grating stripes disposed near a reticle having a mask pattern to be projected, modulating the mask pattern by emission of a light, and demodulating the modulated mask pattern by first grating stripes formed within a photosensitive film made of a material capable of reversibly inducing photochemical reaction, thereby forming the modulated image of the mask pattern within a resist film disposed under the photosensitive film. With this method, various kinds of fine patterns each being smaller than the resolution limit of a projection exposure tool used are formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.