Photoresist composition
US5625020A · kind A · utility
28Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1995 |
| Grant date | Apr 29, 1997 |
| Priority date | — |
| Expiry date | Dec 13, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.