Pattern projecting method
US5627625A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 21, 1994 |
| Grant date | May 6, 1997 |
| Priority date | — |
| Expiry date | Oct 21, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/702
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern projecting method is disclosed. The pattern projecting method has the step of illuminating a mask having a fine pattern formed therein with an exposure light and causing a transmitted light of the mask to be incident on a pupil of a projection optical system to project an image of the fine pattern onto a substrate, the illuminating step using an effective light source capable of achieving such light intensity distribution as to provide a predetermined light intensity in a central region of the pupil, a maximum light intensity in plural peripheral regions around the central region, and a light intensity lower than the maximum light intensity in a region connecting the plural regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.