Tohru Ogawa
25Patents
14h-index
28Co-inventors
81Inventor score
Filing activity: Feb 19, 1976 → Aug 24, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5529951A | Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation | Emerging Cross-Sectional Technologies | 205 | Expired |
| US5345437A | System for controlling frequency multiplexing modems | Electricity | 93 | Expired |
| US5591566A | Method of forming a resist pattern by using a silicon carbide anti-reflective layer | Emerging Cross-Sectional Technologies | 68 | Expired |
| US5869803A | Method of forming polycrystalline silicon layer on substrate and surface treatment apparatus thereof | Emerging Cross-Sectional Technologies | 67 | Expired |
| US6071765A | Method of forming polycrystalline silicon layer on substrate and surface treatment apparatus thereof | Emerging Cross-Sectional Technologies | 63 | Expired |
| US5472829A | Method of forming a resist pattern by using an anti-reflective layer | Emerging Cross-Sectional Technologies | 61 | Expired |
| US5641607A | Anti-reflective layer used to form a semiconductor device | Emerging Cross-Sectional Technologies | 55 | Expired |
| US5698352A | Semiconductor device containing Si, O and N anti-reflective layer | Emerging Cross-Sectional Technologies | 55 | Expired |
| US5472827A | Method of forming a resist pattern using an anti-reflective layer | Emerging Cross-Sectional Technologies | 45 | Expired |
| US5677111A | Process for production of micropattern utilizing antireflection film | Emerging Cross-Sectional Technologies | 44 | Expired |
| US5670297A | Process for the formation of a metal pattern | Emerging Cross-Sectional Technologies | 31 | Expired |
| US5321722A | Multipoint connected communication system having function of retraining modems provided therein and method of retraining the modems | Electricity | 30 | Expired |
| US5473409A | Semiconductor light exposure device | Physics | 29 | Expired |
| US5648202A | Method of forming a photoresist pattern using an anti-reflective | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5627625A | Pattern projecting method | Physics | 14 | Expired |
| US5448595A | Automatic gain control circuit for a demodulation section of a modem | Electricity | 13 | Expired |
| US5689513A | Data transmission system having a backup testing facility | Electricity | 8 | Expired |
| US6611317B1 | Exposure apparatus, semiconductor device, and photomask | Physics | 7 | Expired |
| US6673526B1 | Pattern formation method and method and apparatus for production of a semiconductor device using said method | Physics | 4 | Expired |
| US6448861B2 | PLL controller, method of PLL control, and limiter | Electricity | 3 | Expired |
| US5311282A | High precision stepping aligner having a spiral stepping pattern | Physics | 3 | Expired |
| US4035263A | Composite catalyst for clarifying exhaust gas containing nitrogen oxides and method for producing the same | Performing Operations; Transporting | 3 | Expired |
| US7350503B2 | Fuel injection pump | Mechanical Engineering; Lighting; Heating | 1 | Expired |
| US6880508B2 | Start assister of fuel injection pump | Mechanical Engineering; Lighting; Heating | 1 | Expired |
| US7123797B2 | Directional coupler switch | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.