Chemically amplified positive resist composition
US5629134A · kind A · utility
10Cited by
6References
19Claims
0Family size
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Key dates
| Filing date | Oct 6, 1995 |
| Grant date | May 13, 1997 |
| Priority date | — |
| Expiry date | Oct 6, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a chemically amplified positive resist composition comprising an organic solvent, an alkali soluble resin, an acid generator, and an optional dissolution inhibitor, a salt of a pyridine which may have an alkyl, alkoxy, amino or dialkylamino group with an alkylsulfonic acid, arylsulfonic acid or halogen atom is blended. Because of high sensitivity to deep UV and resolution and elimination of the PED problem causing T-top pattern configuration and the skirting phenomenon, the resist composition is improved in dimensional precision and lends itself to fine patterning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.