Method and instrument for detection of change of thickness or refractive index for a thin film substrate
US5631171A · kind A · utility
180Cited by
49References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 1995 |
| Grant date | May 20, 1997 |
| Priority date | — |
| Expiry date | May 31, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S436/805
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An instrument configured and arranged to detect a change in thickness or refractive index of a thin film substrate. A method for optimizing the instrument and a method for detecting a change in thickness or refractive index of a thin film substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.