Ion implantation apparatus
US5641969A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1996 |
| Grant date | Jun 24, 1997 |
| Priority date | — |
| Expiry date | Mar 28, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/20228
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Ion implantation apparatus has an implant wheel in a vacuum chamber. The implant wheel has a number of circumferentially distributed wafer holding positions and is arranged to spin so that the wafers successively intercept an ion beam. The implant wheel is mounted at the free end of a scanning arm which itself is mounted for reciprocating movement on a wall of the vacuum chamber by means of a rotary vacuum seal. A wheel drive motor is mounted in the vacuum chamber on the rotational axis of the implant wheel and the wheel and drive motor combination can be tilted at the end of the scanning arm to adjust the angle of implantation. The tilt actuator is inside the vacuum chamber mounted on the scanning arm and the tilt axis is such that the axis of rotation of the implant wheel remains always in the same plane as the axis of scan of the scanning arm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.