Patent · US Expired

Wafer testing and self-calibration system

US5642298A · kind A · utility

121Cited by
40References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 26, 1996
Grant dateJun 24, 1997
Priority date
Expiry dateFeb 26, 2016

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A measurement station which rotates a wafer in a vertical plane and moves a scanning sensor linearly along an axis which is parallel to the wafer rotation plane, thus providing a spiral, or other, scan path across the wafer. The vertical orientation reduces errors from weight induced sagging, especially of large, e.g. 300 mm wafers. The measurement station includes wafer grippers which move in the wafer's plane for securing the wafer in position for rotation. The measurement station also includes master calibration gauges which simplify calibration and obviate the need for calibration test wafers. A technique for reducing vibration and assuring scan repeatability includes coasting of the wafer in rotation and coordinated linear probe motions for scanning. Probe measurement data obtained is digitized early and calibration, demodulation, filtering and other processing is done digitally.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.