Stabilizing support mechanism for electron beam apparatus
US5644137A · kind A · utility
Inventors
Key dates
| Filing date | Mar 4, 1996 |
| Grant date | Jul 1, 1997 |
| Priority date | — |
| Expiry date | Mar 4, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/20292
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam apparatus is provided with a support mechanism upon which X and Y axis interferometers are mounted within a vacuum chamber. By employing a flat ring of a low coefficient of thermal expansion glass ceramic composition affixed beneath the chamber upper wall and to which the interferometers are mounted, the normal extremes of vacuum and heat as existing within the chamber are resisted to insure of a fixed horizontal alignment of the beams as projected by the interferometers during operation of the apparatus. Flexure mounts are included for the interferometer ring together with a magnetic shield disposed adjacent the ring undersurface. Stability of workpieces is further enhanced by the use of the same glass ceramic composition in the formation of the carrier and its reference plate of the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.