Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement
US5646413A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 28, 1996 |
| Grant date | Jul 8, 1997 |
| Priority date | — |
| Expiry date | Feb 28, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7015
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed an exposure method for transferring, using an optical system for illuminating a mask having patterns to be transferred on a substrate and a projection optical system for projecting images of the patterns to the substrate, the patterns to the substrate through the projection optical system by means of scanning the mask and the substrate synchronously relative to the projection optical system. The method comprises the steps of providing a plurality of measuring marks on the mask formed along a relative scanning direction, and providing a plurality of reference marks formed on the stage corresponding to the measuring marks, respectively, moving the mask and the substrate synchronously in the relative scanning direction to measure successively a displacement amount between the measuring marks on the mask and the reference marks, and obtaining a correspondence relation between a coordinate system on the mask and a coordinate system on the stage according to the displacement amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.