Antireflective coatings for photoresist compositions
US5652317A · kind A · utility
19Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 1996 |
| Grant date | Jul 29, 1997 |
| Priority date | — |
| Expiry date | Aug 16, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D133/26
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.