Ping-Hung Lu
44Patents
9h-index
52Co-inventors
78Inventor score
Filing activity: Sep 28, 1992 → Nov 3, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5733714A | Antireflective coating for photoresist compositions | Emerging Cross-Sectional Technologies | 40 | Expired |
| US7235348B2 | Water soluble negative tone photoresist | Physics | 36 | Expired |
| US5981145A | Light absorbing polymers | Chemistry; Metallurgy | 30 | Expired |
| US5994430A | Antireflective coating compositions for photoresist compositions and use thereof | Physics | 27 | Expired |
| US5476750A | Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists | Physics | 26 | Expired |
| US5652297A | Aqueous antireflective coatings for photoresist compositions | Chemistry; Metallurgy | 26 | Expired |
| US9093635B2 | Controlling on-state current for two-terminal memory | Electricity | 24 | Active |
| US5652317A | Antireflective coatings for photoresist compositions | Chemistry; Metallurgy | 19 | Expired |
| US6576394B1 | Negative-acting chemically amplified photoresist composition | Emerging Cross-Sectional Technologies | 13 | Expired |
| US9520561B1 | Controlling on-state current for two-terminal memory | Electricity | 9 | Active |
| US7255970B2 | Photoresist composition for imaging thick films | Emerging Cross-Sectional Technologies | 7 | Expired |
| US5876897A | Positive photoresists containing novel photoactive compounds | Physics | 7 | Expired |
| US8017296B2 | Antireflective coating composition comprising fused aromatic rings | Electricity | 6 | Active |
| US5371169A | Novolak resin mixtures | Chemistry; Metallurgy | 6 | Expired |
| US5612164A | Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone | Physics | 6 | Expired |
| US5853954A | Fractionated novolak resin and photoresist composition therefrom | Physics | 5 | Expired |
| US6800415B2 | Negative-acting aqueous photoresist composition | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6103443A | Photoresist composition containing a novel polymer | Physics | 5 | Expired |
| US5763135A | Light sensitive composition containing an arylhydrazo dye | Physics | 4 | Expired |
| US5910559A | Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom | Chemistry; Metallurgy | 4 | Expired |
| US8841062B2 | Positive working photosensitive material | Physics | 4 | Active |
| US6045966A | Fractionated novolak resin and photoresist composition therefrom | Chemistry; Metallurgy | 3 | Expired |
| US5719004A | Positive photoresist composition containing a 2,4-dinitro-1-naphthol | Physics | 3 | Expired |
| US11159151B1 | Calibrating a phase interpolator by amplifying timing differences | Electricity | 3 | Active |
| US8026201B2 | Stripper for coating layer | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.