Patent · US Expired

Method for controlling growth of a silicon crystal

US5653799A · kind A · utility

37Cited by
12References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 2, 1995
Grant dateAug 5, 1997
Priority date
Expiry dateJun 2, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1008
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

System and method for determining the diameter of a silicon crystal being pulled from a silicon melt for controlling a silicon crystal growing apparatus. The melt has a surface with a meniscus which is visible as a bright ring adjacent the crystal. A camera generates an image pattern of a portion of the bright ring adjacent the crystal. Image processing circuitry detects a characteristic of the image pattern and defines an edge of the bright ring as a function of the detected characteristic. The image processing circuitry further defines a generally circular shape including the defined edge of the bright ring. The diameter of the crystal is then determined based on the diameter of the defined shape for use in controlling the crystal growing apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.