Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
US5656413A · kind A · utility
2Cited by
28References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1995 |
| Grant date | Aug 12, 1997 |
| Priority date | — |
| Expiry date | Sep 28, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/948
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides methods for producing TPPA having low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such TPPA for producing semiconductor devices using such photoresist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.