Daniel P. Aubin
16Patents
8h-index
9Co-inventors
57Inventor score
Filing activity: Dec 29, 1992 → Apr 2, 1998
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5476750A | Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists | Physics | 26 | Expired |
| US5521052A | Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom | Emerging Cross-Sectional Technologies | 25 | Expired |
| US5962183A | Metal ion reduction in photoresist compositions by chelating ion exchange resin | Physics | 10 | Expired |
| US5688893A | Method of using a Lewis base to control molecular weight of novolak resins | Physics | 10 | Expired |
| US5739265A | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Physics | 9 | Expired |
| US5837417A | Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition | Physics | 9 | Expired |
| US5693749A | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Chemistry; Metallurgy | 8 | Expired |
| US5665517A | Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom | Physics | 8 | Expired |
| US5750632A | Isolation of novolak resin by low temperature sub surface forced steam distillation | Physics | 6 | Expired |
| US5750031A | Process for producing surfactant having a low metal ion level and developer produced therefrom | Physics | 6 | Expired |
| US5853947A | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate | Physics | 2 | Expired |
| US5858627A | Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers | Physics | 2 | Expired |
| US5656413A | Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5614349A | Using a Lewis base to control molecular weight of novolak resins | Physics | 1 | Expired |
| US5976761A | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Physics | 0 | Expired |
| US6165675A | Isolation of novolak resin by low temperature sub surface forced steam distillation | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.