Semiconductor processing spray coating apparatus
US5658387A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 1995 |
| Grant date | Aug 19, 1997 |
| Priority date | — |
| Expiry date | Apr 12, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/26
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A semiconductor processor for spray coating wafers or other semiconductor articles. The processor has a compartment in which are mounted a wafer transfer, coating station and thermal treatment station. The coating station has a spray processing vessel in which a movable spray-head and rotatable wafer holder. The spray station has coating viscosity control features. An ultrasonic resonating spray-head is precisely supplied with coating from a metering pump. The heat treatment station heat cures the coating and then cools the wafer. The system allows coatings to be applied in relatively uniform conformational layers upon irregular surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.