Semitool, Inc.
🏢 View company profile →382Patents
25Active
382Granted
45Portfolio score
Filing activity: Apr 27, 1987 → Oct 26, 2007 · 25 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6976822B2 | End-effectors and transfer devices for handling microelectronic workpieces | Emerging Cross-Sectional Technologies | 507 | Expired |
| US5947718A | Semiconductor processing furnace | Chemistry; Metallurgy | 467 | Expired |
| US6447232B1 | Semiconductor wafer processing apparatus having improved wafer input/output handling system | Emerging Cross-Sectional Technologies | 463 | Expired |
| US6197181A | Apparatus and method for electrolytically depositing a metal on a microelectronic workpiece | Electricity | 440 | Expired |
| US6565729B2 | Method for electrochemically depositing metal on a semiconductor workpiece | Emerging Cross-Sectional Technologies | 328 | Expired |
| US6319387A | Copper alloy electroplating bath for microelectronic applications | Electricity | 264 | Expired |
| US6080291A | Apparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal member | Chemistry; Metallurgy | 229 | Expired |
| US6932892B2 | Apparatus and method for electrolytically depositing copper on a semiconductor workpiece | Electricity | 176 | Expired |
| US5222310A | Single wafer processor with a frame | Emerging Cross-Sectional Technologies | 144 | Expired |
| US5377708A | Multi-station semiconductor processor with volatilization | Emerging Cross-Sectional Technologies | 142 | Expired |
| US5224504A | Single wafer processor | Emerging Cross-Sectional Technologies | 126 | Expired |
| US6286231A | Method and apparatus for high-pressure wafer processing and drying | Electricity | 114 | Expired |
| US6318951A | Robots for microelectronic workpiece handling | Emerging Cross-Sectional Technologies | 104 | Expired |
| US5168886A | Single wafer processor | Emerging Cross-Sectional Technologies | 97 | Expired |
| US5235995A | Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization | Emerging Cross-Sectional Technologies | 97 | Expired |
| US6277263A | Apparatus and method for electrolytically depositing copper on a semiconductor workpiece | Electricity | 96 | Expired |
| US5174045A | Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers | Emerging Cross-Sectional Technologies | 89 | Expired |
| US5985126A | Semiconductor plating system workpiece support having workpiece engaging electrodes with distal contact part and dielectric cover | Electricity | 84 | Expired |
| US5232511A | Dynamic semiconductor wafer processing using homogeneous mixed acid vapors | Physics | 83 | Expired |
| US6004440A | Cathode current control system for a wafer electroplating apparatus | Emerging Cross-Sectional Technologies | 83 | Expired |
| US6638410B2 | Apparatus and method for electrolytically depositing copper on a semiconductor workpiece | Electricity | 83 | Expired |
| US6254742A | Diffuser with spiral opening pattern for an electroplating reactor vessel | Emerging Cross-Sectional Technologies | 81 | Expired |
| US5762751A | Semiconductor processor with wafer face protection | Electricity | 79 | Expired |
| US5658387A | Semiconductor processing spray coating apparatus | Physics | 77 | Expired |
| US5994675A | Semiconductor processing furnace heating control system | Electricity | 77 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.