Method and device for the comminution of semiconductor material
US5660335A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 11, 1994 |
| Grant date | Aug 26, 1997 |
| Priority date | — |
| Expiry date | May 11, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB02C19/0056
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for the contamination-free comminution of semiconductor material cludes an apparatus by which the method is carried out. The method includes creating at least one liquid jet by applying pressure to a liquid and forcing it through a nozzle, and directing the liquid jet against the semiconductor material, so that it impinges on its surface at high velocity. The apparatus includes a container for receiving comminuted semiconductor material, at least one nozzle through which a liquid jet is directed at high velocity against the semiconductor material to be comminuted, a conveyor device for removing the comminuted semiconductor material from the container, means for releasing and interrupting the liquid jet, and means for positioning the nozzle and/or advancing the semiconductor material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.