Antireflection film and exposure apparatus using the same
US5661596A · kind A · utility
21Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 3, 1995 |
| Grant date | Aug 26, 1997 |
| Priority date | — |
| Expiry date | Feb 3, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This specification discloses antireflection film and an exposure apparatus using the same. The exposure apparatus has an optical system, and antireflection film formed on the refracting surface of the optical system, the antireflection film having a high refractive index layer having Al.sub.2 O.sub.3 or Ta.sub.2 O.sub.5 and a low refractive index layer having SiO.sub.2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.