Ryuji Biro
12Patents
7h-index
7Co-inventors
55Inventor score
Filing activity: Feb 3, 1995 → Aug 29, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6458253B2 | Thin film production process and optical device | Chemistry; Metallurgy | 29 | Expired |
| US5911856A | Method for forming thin film | Chemistry; Metallurgy | 24 | Expired |
| US5661596A | Antireflection film and exposure apparatus using the same | Physics | 21 | Expired |
| US5885712A | Anti-reflection film and optical system using the same | Chemistry; Metallurgy | 15 | Expired |
| US6472087B1 | Antireflection film, optical element with antireflection film, and production method of the antireflection film | Physics | 14 | Expired |
| US6261696A | Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element | Physics | 8 | Expired |
| US6217719A | Process for thin film formation by sputtering | Chemistry; Metallurgy | 8 | Expired |
| US6396626B1 | Antireflection film and optical element coated with the antireflection film | Physics | 6 | Expired |
| US6383346B2 | Method for forming thin films | Chemistry; Metallurgy | 4 | Expired |
| US7301695B2 | Anti-reflective film and optical element having anti-reflective film | Physics | 3 | Expired |
| US7041391B2 | Method for forming thin films | Chemistry; Metallurgy | 1 | Expired |
| US7455880B2 | Optical element fabrication method, optical element, exposure apparatus, device fabrication method | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.