Patent · US Expired

Method for repairing a defect generated cell using a laser

US5665638A · kind A · utility

1Cited by
2References
2Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 7, 1995
Grant dateSep 9, 1997
Priority date
Expiry dateJul 7, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/94
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The invention provides a method for repairing a defect-generated cell using a laser for disconnecting a defect-generated portion of a fuse conductive line in the fabricating process of semiconductor integrated circuits, characterized in that an insulation layer on the fuse conductive line is isotropically etched partially to a predetermined thickness for the purpose of refracting laser beam incident to the defect-generated portion of the fuse conductive line.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.