Patent · US Expired

Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it

US5665905A · kind A · utility

19Cited by
7References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 7, 1995
Grant dateSep 9, 1997
Priority date
Expiry dateJun 7, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24926
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for measuring the width of a tip in an Atomic Force Microscope/Scanning Tunneling Microscope using a calibration standard is provided. The method incorporates the steps of providing a tip, measuring the width b1 of a first kind of structure, and measuring the width b2 of a second kind of structure. The steps of measuring comprise the steps of profiling the first and second kinds of structures with a tip and calculating the width of the tip as a function of the measured widths b1 and b2. The calibration standard comprises the first and second kinds of structures and may be, for example, a trench and a raised line which have substantially the same width.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.