Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it
US5665905A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 1995 |
| Grant date | Sep 9, 1997 |
| Priority date | — |
| Expiry date | Jun 7, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24926
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for measuring the width of a tip in an Atomic Force Microscope/Scanning Tunneling Microscope using a calibration standard is provided. The method incorporates the steps of providing a tip, measuring the width b1 of a first kind of structure, and measuring the width b2 of a second kind of structure. The steps of measuring comprise the steps of profiling the first and second kinds of structures with a tip and calculating the width of the tip as a function of the measured widths b1 and b2. The calibration standard comprises the first and second kinds of structures and may be, for example, a trench and a raised line which have substantially the same width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.