Patent · US Expired

Process for reducing transient diffusion of dopant atoms

US5670391A · kind A · utility

10Cited by
0References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 7, 1995
Grant dateSep 23, 1997
Priority date—
Expiry dateAug 7, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S148/144
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Transient enhanced diffusion (TED) of dopants is reduced by bring the surface closer to the implant damage prior to the annealing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.