Substrate drying apparatus and substrate drying method
US5671544A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Aug 20, 1996 |
| Grant date | Sep 30, 1997 |
| Priority date | — |
| Expiry date | Aug 20, 2016 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B21/145
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatment liquid, a receiving container, provided below the object containing region, for receiving water removed from the object with use of the evaporated treatment liquid, an exhaust pipe, attached to the container, for exhausting the water from the container to the outside of the process bath, and a cooling device, provided above the object containing region of the process bath, for condensing the evaporated treatment liquid, wherein the exhaust pipe has a valve and a branch pipe branched from the exhaust pipe such that the branch pipe is closer to the container than the valve is.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.