Scattering reticle for electron beam systems
US5674413A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 22, 1995 |
| Grant date | Oct 7, 1997 |
| Priority date | — |
| Expiry date | Nov 22, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reticle for an electron beam system for direct writing applications has a base layer that contains a reticle pattern; a set of reinforcing struts connected to the base layer separating the base layer into a set of non-contiguous subfields; in which the pattern is carried by a set of apertures in said base layer; and in which the base thickness is set such that the probability that an electron traversing said base thickness will suffer a collision that removes it from the beam is greater than 90% while the probability that the electron will be absorbed is low; and in which, optionally, selected subfields of the reticle are compensated for errors in the remainder of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.