Hans C. Pfeiffer
25Patents
16h-index
25Co-inventors
81Inventor score
Filing activity: Jul 26, 1974 → Apr 25, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4818885A | Electron beam writing method and system using large range deflection in combination with a continuously moving table | Electricity | 64 | Expired |
| US4417203A | System for contactless electrical property testing of multi-layer ceramics | Performing Operations; Transporting | 51 | Expired |
| US4243866A | Method and apparatus for forming a variable size electron beam | Electricity | 43 | Expired |
| US4415851A | System for contactless testing of multi-layer ceramics | Physics | 43 | Expired |
| US4213053A | Electron beam system with character projection capability | Electricity | 43 | Expired |
| US6180947A | Multi-element deflection aberration correction for electron beam lithography | Electricity | 33 | Expired |
| US4376249A | Variable axis electron beam projection system | Electricity | 32 | Expired |
| US5466904A | Electron beam lithography system | Electricity | 32 | Expired |
| US5633507A | Electron beam lithography system with low brightness | Electricity | 30 | Expired |
| US4544846A | Variable axis immersion lens electron beam projection system | Electricity | 29 | Expired |
| US4843330A | Electron beam contactless testing system with grid bias switching | Physics | 28 | Expired |
| US6069684A | Electron beam projection lithography system (EBPS) | Electricity | 23 | Expired |
| US5545902A | Electron beam lithography system | Electricity | 20 | Expired |
| US3984687A | Shielded magnetic lens and deflection yoke structure for electron beam column | Electricity | 20 | Expired |
| US4859856A | Telecentric sub-field deflection with vail | Electricity | 17 | Expired |
| US5674413A | Scattering reticle for electron beam systems | Physics | 16 | Expired |
| US4945246A | Tri-deflection electron beam system | Electricity | 16 | Expired |
| US4423305A | Method and apparatus for controlling alignment of an electron beam of a variable shape | Electricity | 14 | Expired |
| US4251728A | Compensated magnetic deflection coil for electron beam lithography system | Electricity | 11 | Expired |
| US5935739A | Manufacturing method for membrane lithography mask with mask fields | Electricity | 11 | Expired |
| US4000440A | Method and apparatus for controlling brightness and alignment of a beam of charged particles | Electricity | 8 | Expired |
| US6130432A | Particle beam system with dynamic focusing | Electricity | 7 | Expired |
| US6296976A | Compensation of within-subfield linewidth variation in e-beam projection lithography | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6710361B2 | Multi-beam hybrid solenoid lens electron beam system | Electricity | 3 | Expired |
| US6633040B1 | Solenoid electron beam lenses with high demagnification and low aberrations | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.