Chemical vapor deposition of tantalum- or niobium-containing coatings
US5677002A · kind A · utility
28Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 1995 |
| Grant date | Oct 14, 1997 |
| Priority date | — |
| Expiry date | May 30, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formula EQU M(OR.sup.1).sub.x (R.sup.2 --C(GH)--C--C(G)--R.sup.3).sub.y wherein M is tantalum or niobium; G is oxygen or sulfur; and R.sup.1, R.sup.2, and R.sup.3 are independently selected hydrocarbyl, fluoroalkyl or alkoxy groups,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.