Method of making X-ray mask having reduced stress
US5677090A · kind A · utility
12Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 21, 1996 |
| Grant date | Oct 14, 1997 |
| Priority date | — |
| Expiry date | Feb 21, 2016 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0169
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of making a X-ray mask including: a step of forming a X-ray absorber above a substrate; a step of controlling a stress of the X-ray absorber by a predetermined condition; and wherein the predetermined condition for controlling the stress of the X-ray absorber formed above the substrate is determined by a measured value of a stress of a X-ray absorber formed on a monitor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.