Method and apparatus for pattern exposure, mask used therefor, and semiconductor integrated circuit produced by using them
US5677755A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1994 |
| Grant date | Oct 14, 1997 |
| Priority date | — |
| Expiry date | Oct 28, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70241
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern exposure method including the steps of irradiating a mask or reticle having a desired original pattern written thereon with light with a desired directivity from an illuminating light source for exposure, and projecting a transmitted or reflected light from said mask to an object to be exposed through a projection optical system, wherein a pattern-dependent polarizing mask for giving polarization characteristics in compliance with the direction of the pattern on the mask to the illuminating light transmitted through the pattern; and a pattern exposure apparatus including a illuminating light for exposure, a mask or a reticle, an illumination optical system for irradiating the mask with light emitted from the light source, and a projection optical system for projecting the transmitted or reflected light from the mask onto the object to be exposed, further including polarizing unit for polarizing the illuminating light on the pupil of the projection optical system so as to be nearly rotationally symmetric with respect to the center of the pupil when the mask is not used; and a mask, used with said pattern exposure apparatus, for giving pattern-dependent polarization charact…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.