Apparatus for manufacturing semiconductor device
US5679165A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 18, 1995 |
| Grant date | Oct 21, 1997 |
| Priority date | — |
| Expiry date | Sep 18, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68785
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus, for forming a film according to an automated continuous CVD (Chemical Vapor Deposition) method includes a wafer holder having a plurality of separate, detachable susceptors, a rotary shaft for rotating the wafer holder to rotate wafer mounting surfaces of the susceptors in one plane, a gas distributor spaced from the wafer holder and facing the moving surface of the wafer mounting surface to discharge a reaction gas onto the wafer mounting surfaces, and a heating instrument spaced from the wafer holder and facing the moving surface of the opposite side of the wafer mounting surfaces, in order to keep the wafer at a stable temperature during forming a film and to allow maintenance and repair to be easily and efficiently performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.