Method of removing photoresist film
US5681487A · kind A · utility
5Cited by
7References
16Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 7, 1995 |
| Grant date | Oct 28, 1997 |
| Priority date | — |
| Expiry date | Jul 7, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method of removing a photoresist film, which exhibits the high ability to remove photoresist and excellent safety and handling properties such as workability, In the removing method, the photoresist film is removed by chemical decomposition in an inorganic aqueous solution under ultraviolet-light irradiation. The inorganic aqueous solution is an aqueous solution of peroxomonosulfate or an aqueous solution containing 4.5 to 36 wt % of sulfuric acid and 0.05 to 0.8 wt % of hydrogen peroxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.