System and method for performing optical proximity correction on macrocell libraries
US5682323A · kind A · utility
304Cited by
14References
9Claims
0Family size
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Key dates
| Filing date | Mar 6, 1995 |
| Grant date | Oct 28, 1997 |
| Priority date | — |
| Expiry date | Mar 6, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The system and method performs optical proximity correction on an integrated circuit (IC) mask design by initially performing optical proximity correction on a library of cells that are used to create the IC. The pre-tested cells are imported onto a mask design. All cells are placed a minimum distance apart to ensure that no proximity effects will occur between elements fully integrated in different cells. An optical proximity correction technique is performed on the mask design by performing proximity correction only on those components, e.g., lines, that are not fully integrated within one cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.