Method for depositing a substance with temperature control
US5683759A · kind A · utility
14Cited by
26References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 1996 |
| Grant date | Nov 4, 1997 |
| Priority date | — |
| Expiry date | Jul 1, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing a substance, such as diamond, by plasma deposition on a substrate mounted over a madrel cooled by a heat exchange, comprising the steps of: determining the heat flux at the deposition surface of the substrate; providing, between said mandrel and said substrate, a spacer having a thermal conductance in its thickness direction that varies in accordance with said determined heat flux; and depositing said substance on said substrate by said plasma deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.