Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system
US5684565A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 1994 |
| Grant date | Nov 4, 1997 |
| Priority date | — |
| Expiry date | Sep 12, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.