Surface processing method effected for total-reflection X-ray fluorescence analysis
US5686314A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 19, 1994 |
| Grant date | Nov 11, 1997 |
| Priority date | — |
| Expiry date | Dec 19, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/25375
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A surface processing method effected before the total-reflection X-ray fluorescence analysis is effected is disclosed. The surface processing is to modify all of the contaminants attached at least to the measurement surface of the wafer into particle-shaped residues. For this purpose, the measurement surface of the wafer is first dissolved by hydrofluoric acid to form a large number of droplets on the measurement surface. Next, the thus formed droplets are dried with the position thereof kept unchanged. After the drying, contaminants attached to the measurement surface of the wafer are left as particle-shaped residues. After this, the measurement surface of the wafer is analyzed by the total-reflection X-ray fluorescence analyzing method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.