Methods for producing polybenzoxazol precursors and corresponding resist solutions

US5688631A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Recai Sezi · Simmerath, DE
• Hellmut Ahne · Königsee, DE
• Eva Rissel · Forchheim, DE

Key dates

• Filing date: Mar 19, 1996
• Grant date: Nov 18, 1997
• Expiry date: Mar 19, 2016

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0233
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Methods for producing solutions of polybenzoxazol precursors that are soluble in alkali and resist solutions based on such precursors. A dicarboxylic acid halogenide is reacted with a bis-(o-aminophenol) in an organic solvent and in the presence of a polymer with a tertiary N atom, which is insoluble in the solvent. Excess polymer and hydrohalogenide are separated from the reaction solution. The reaction solution is optionally mixed with a photoactive component.