Method of using a Lewis base to control molecular weight of novolak resins
US5688893A · kind A · utility
10Cited by
6References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 1996 |
| Grant date | Nov 18, 1997 |
| Priority date | — |
| Expiry date | Dec 20, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.