Pellicle for protection of photolithographic mask
US5691088A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1992 |
| Grant date | Nov 25, 1997 |
| Priority date | — |
| Expiry date | Sep 22, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2852
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.