Process for brush cleaning
US5693148A · kind A · utility
27Cited by
11References
52Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 8, 1995 |
| Grant date | Dec 2, 1997 |
| Priority date | — |
| Expiry date | Nov 8, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for brush cleaning used in semiconductor wafer scrubbing systems. A process for brush cleaning that eliminates and/or reduces the load-up of brushes with contaminants. This brush cleaning process changes the pH level of a brush to repel contaminants that are on the brush. This process extends the useful life of the brush without significantly decreasing the throughput of the scrubbing system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.