OnTrak Systems, Inc.
🏢 View company profile →34Patents
0Active
34Granted
38Portfolio score
Filing activity: Nov 30, 1992 → Jan 7, 1999
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5692947A | Linear polisher and method for semiconductor wafer planarization | Performing Operations; Transporting | 189 | Expired |
| US5558568A | Wafer polishing machine with fluid bearings | Performing Operations; Transporting | 153 | Expired |
| US5593344A | Wafer polishing machine with fluid bearings and drive systems | Performing Operations; Transporting | 127 | Expired |
| US5803799A | Wafer polishing head | Performing Operations; Transporting | 119 | Expired |
| US5575707A | Polishing pad cluster for polishing a semiconductor wafer | Performing Operations; Transporting | 109 | Expired |
| US5800248A | Control of chemical-mechanical polishing rate across a substrate surface | Performing Operations; Transporting | 101 | Expired |
| US5806126A | Apparatus for a brush assembly | Emerging Cross-Sectional Technologies | 68 | Expired |
| US5475889A | Automatically adjustable brush assembly for cleaning semiconductor wafers | Performing Operations; Transporting | 68 | Expired |
| US5851041A | Wafer holder with spindle assembly and wafer holder actuator | Emerging Cross-Sectional Technologies | 54 | Expired |
| US5745946A | Substrate processing system | Emerging Cross-Sectional Technologies | 52 | Expired |
| US5566466A | Spindle assembly with improved wafer holder | Emerging Cross-Sectional Technologies | 48 | Expired |
| US5442828A | Double-sided wafer scrubber with a wet submersing silicon wafer indexer | Electricity | 40 | Expired |
| US5861066A | Method and apparatus for cleaning edges of contaminated substrates | Emerging Cross-Sectional Technologies | 39 | Expired |
| US5857899A | Wafer polishing head with pad dressing element | Performing Operations; Transporting | 33 | Expired |
| US5762084A | Megasonic bath | Emerging Cross-Sectional Technologies | 28 | Expired |
| US5727332A | Contamination control in substrate processing system | Electricity | 28 | Expired |
| US5693148A | Process for brush cleaning | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5794299A | Containment apparatus | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5913714A | Method for dressing a polishing pad during polishing of a semiconductor wafer | Performing Operations; Transporting | 25 | Expired |
| US5858109A | Method and apparatus for cleaning of semiconductor substrates using standard clean 1 (SC1) | Emerging Cross-Sectional Technologies | 25 | Expired |
| US5723019A | Drip chemical delivery method and apparatus | Emerging Cross-Sectional Technologies | 24 | Expired |
| US5529638A | Method for wafer scrubbing | Electricity | 24 | Expired |
| US5571044A | Wafer holder for semiconductor wafer polishing machine | Performing Operations; Transporting | 24 | Expired |
| US5975736A | Scrubber control system | Emerging Cross-Sectional Technologies | 22 | Expired |
| US5868863A | Method and apparatus for cleaning of semiconductor substrates using hydrofluoric acid (HF) | Emerging Cross-Sectional Technologies | 21 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.