Flux washing agent
US5693599A · kind A · utility
2Cited by
2References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 1, 1996 |
| Grant date | Dec 2, 1997 |
| Priority date | — |
| Expiry date | Apr 1, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/26
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A flux washing agent which comprises an aqueous solution containing a quaternary ammonium salt and hydrazine is disclosed. The flux washing agent is used in the production of printed circuit boards and the like. The flux washing agent has a washing ability, and a property to suppress etching of solder which are comparable with those of Flon 113 and trichloroethylene heretofore used as flux washing agents. Furthermore, the flux washing agent is safe, does not cause environmental pollution and has an excellent rinsing property.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.