Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US5699183A · kind A · utility
19Cited by
9References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 7, 1995 |
| Grant date | Dec 16, 1997 |
| Priority date | — |
| Expiry date | Jun 7, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S501/905
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.